Thin Film Coating Services

MAT-VAC holds an expertise in thin film sputter coating technology. Our highly knowledgeable process engineers and technicians utilize batch sputter deposition equipment and the latest analytical techniques to produce high quality thin films that meet your most demanding deposition requirements.

MAT-VAC has an extensive inventory of almost any target material imaginable, including many standard high purity materials, exotic alloy materials, precious metals and ceramic dielectric sputtering targets, which are available in a wide range of different sizes and shapes. RF Diode, RF Magnetron, and DC Magnetron sputtering modes are utilized to produce thin films that are highly uniform, dense, homogeneous, and stoichiometric.

Flexible Substrates
MAT-VAC has a great deal of expertise in sputter coating flexible substrates such as Polyimide (Kapton) and PET Polyester (Mylar) with single and multi-layer thin film coatings. Flexible thin film applications are currently of high interest, due to the need for flexible circuits, which offer product design advantages of; lightness, miniaturization, compactness, weight reduction and the ability to flex in a variety of ways.

MAT-VAC has developed proprietary processes, which promote excellent adhesion and maximum flexibility. Materials such as ITO, various metals, and oxides have been successfully achieved in this manner.

Co-Sputtering Capability
MAT-VAC has developed a unique co-sputtering capability which allows us to deposit simultaneously from two (2) sputtering sources/targets. This capability can be utilized to form alloys and blended materials in a wide range of compoisitions.

Hybrid/Resistive Thin Films
A wide range of thin films can be deposited. These films are sputtered under carefully controlled conditions producing excellent resistive and TCR (temperature coefficient of resistance) results. Possible applications include: flat panel displays, light valves, and thin film resistors.


Magnetic Thin Films
Co-Ni, Co-Cr, and Ni-Fe alloy films for magnetic media and recording heads can be deposited.


Oxides
Reactively sputtered oxide films can be deposited onto a variety of substrates. Growth conditions, such as substrate temperature and gas pressures, are carefully controlled, providing superior film structure and properties. Thin films of the transparent conductor - Indium Tin Oxide (ITO) for flat panel display and liquid crystal device developments can also be produced.

Nitrides
A reactive sputtering process can deposit silicon and titanium nitride films with excellent electrical, mechanical, and optical properties. Titanium films are becoming more widely used as passivation layers for VLSI, decorative gold coatings, and wear coatings.

For MAT-VAC to consider your thin film requirement submit here.

For our Thin Film Thickness Conversion Table, click here.