MVT-8X Series Sputtering System Specifications

• MAT-VAC EXCLUSIVE ADVANCED FEATURES:
  
  
• GUI BASED PLC OPERATING SYSTEM with RASP:
  1. MAT-VAC"s innovative state-of-the-art Universal Sputterer PLC GUI design combined with Remote Access Support Program (RASP) allows MAT-VAC the capability to download software updates, revisions, fixes and diagnose software/hardware problems over a secure, virus protected, high speed internet connection from its Florida, USA based headquarters location or any other location. Learn more.
  2. Comprehensive online/interactive/multimedia system documentation for all hardware and software and one printed hard copy.
  3. New Dell™ PC with Dell™ LCD Monitor with optional 17" touch screen available.
  
  
• SEPARATE DETACHABLE 19" RACK MOUNT ELECTRONIC CONTROLS:
  
  
• SYSTEM DESIGN AND SPUTTERING CAPABILITIES:
  1. Up to four (4) Targets Lid Mounted configured for sputter down horizontal sputtering.
  1. The MVT-8X/3 is a three (3) target sputtering system
  2. The MVT-8X/4 is a four (4) target sputtering system
  2. DC Magnetron, RF Magnetron and RF Diode sputtering Capabilities.
  3. 24 Volts DC components designed throughout each MAT-VAC batch sputtering system with EMO circuitry.
  4. Advanced optical position feedback on shutter
  5. Each MAT-VAC Model MVT-8X Series Batch Sputtering System includes:
  1. New MAT-VAC designed modular electro-pneumatic valve bank.
  2. Electro-pneumatic gate valve for process chamber
  6. High quality O-ring seals, bearings, fasteners, water lines, gas lines, air lines, and wiring are utilized throughout.
  7. Main Chassis frame is professionally powder coated with a very durable and scratch resistant finish.
  8. Proteus interlock water flow switches
  9. New MAT-VAC designed electronic circuitry, electrical wiring & power distribution box/circuit breakers - No FUSES to stock!
  
  
• VACUUM SYSTEM:
  1. The VAC-LOC™ Load Lock cycles four (4) nominal 7" diameter substrate holders to/from the main deposition process chamber. Manual Load Lock operation is standard. Fully automatic Load Lock operation is optional.
  2. The VAC-LOC™ Load Lock Chamber is high vacuum pumped by a dedicated turbomolecular pump. Rough pumping is by the main system mechanical roughing pump
  3. One (1) 6" Con Flat Flange (C.F.F.) Pyrex viewport with viewport shutter actuated by ferrofluidic type rotary feedthrough on front of main deposition chamber.
  4. CTI-8 cryo pump on main process chamber with Oxford Instruments E350 digital temperature readout gauge. Cold Head pressure is also shown via digital dual set point indicator.
  5. CTI Air cooled cryo compressor (Water cooled compressor optional.)
  6. Software includes AutoRegen feature for unattended Cryo Regeneration.
  7. 17 CFM Welch mechanical roughing pump. Other mechanical roughing pumps are available upon customer request.
  8. Easily removable stainless steel chamber shielding.
  
  
• VACUUM GAUGING:
  1. Digital Vacuum Gauge / Controls (Granville-Phillips / Digivac)
  
  
• SPUTTERING GAS INSTRUMENTATION:
  1. MKS automatic gas control system with up to four (4) each (one is standard) MKS mass flow controllers, MKS 250, MKS 247 and MKS Baratron Gauge.
  2. Electro-Pneumatic throttle valve with Bimba Pneumatic Actuator
  
  
• SPUTTERING CATHODE OPTIONS:
  1. Choice of MRC-type circular/round Cathode Assemblies:
     • RF Diode
     • RF/DC Magnetron
  2. Other cathode selections are available upon customer request
  
  
• POWER SUPPLY OPTIONS:
  1. Advanced Energy model 5kW or 10kW Solid State DC Magnetron sputtering Supply options.
  2. Advanced Energy model 1250 or 3000 Watt Solid State RF (13.56 MHz) Sputtering/Etching power supply options.
     RF Sputtering comes standard with advanced RF Autotune network for optimum coating efficiency
  
  
• MAJOR OPTIONS:
  1. Fully automatic VAC-LOC Load Lock operation with precise optical encoder positioning, completely integrated with the Universal Sputterer™ Automatic Control System.
  2. Infra-Red quartz heater assembly with Watlow heater PID control
  3. RF Autotune RF matching network engineered by MAT-VAC. The problematic MRC designed target selector switch has been completely eliminated.
  
  
• NOMINAL PHYSICAL DIMENSIONS:
  1. Main Chassis: (Excluding Separate 24" W x 30" D x 84" H (nominal) Universal Sputterer™ Control Rack common to all models.)
     
     
     Approximate Weight: 2500 pounds (1134 kg)
     
     
  2. Vacuum Chamber:
     Cylindrical/round, 304 stainless steel, nominal 26" diameter x 10" high.
  
  
• AC POWER INPUT REQUIREMENTS:
  1. 208 Volts, 100 Amps, 60 Hz, Y
     Note: Customer can utilize an external 45 KVA step-down or step-up transformer to accommodate other AC power input voltages. 50 Hz compatibility is available upon request (requires frequency converter for cryo pump compressor and 50 Hz motor on mechanical pump and hydraulic pump.)