MVT-8X Series Sputtering Systems

Evolved from the popular MRC 8667 and MRC 8671, the MAT-VAC 8X Series Universal Sputterer™ automated cylindrical chamber R&D/ Pilot Production batch sputtering systems feature horizontal "Sputter Down" mode of sputtering in three or four target positions, DC magnetron, RF magnetron and RF diode sputtering mode capabilities at each target position. A circular rotating water cooled annular substrate table is capable of being RF Biased for substrate RF sputter etching. In process heating of substrates via a radiant heater accessory mounted on the top plate/lid is available. A main circular rotating shutter is utilized to prevent contamination between adjacent targets and a separate paddle shutter is present to safe guard the heater or forth target from being sputtered or etched upon.

The 8X can be equipped for RF/RF co-sputtering by way of an innovative RF power splitting option.

The 8X Series can be equipped with either a manual or automatic load lock chamber that can be either rough pumped or high vacuum pumped by a dedicated turbomolecular pump.

Static and multi-pass substrate deposition modes are featured for the utmost process control under the control of a modern state of the art motor/speed control system and optical encoder for precise positioning.

Cathodes choices are available to cover every conceivable sputtering application consist of MRC type circular/round 8" & 6.5" diameter RF/DC magnetron, and 6" (can be adapted to smaller diameters) & 8" diameter RF diode. Smaller size cathode are available upon request.

A modern RF automatic matching network provides excellent, stable RF tuning capabilities for RF sputtering and RF etching. Advanced Energy solid state RF power supplies are available in 1250 and 3000 watts. The MAT-VAC design employs vacuum relays to switch between RF and DC modes and cathode selection.

Advanced Energy solid state power supplies are available in 5 and 10 KW models for DC magnetron sputtering.

Up to 4 sputtering gas channels are available with modern MKS Instrumentation.

Vacuum gauging controls consists of modern digital Granville Philips 307 and Digivac.

A CTI-8 cryo pump is provided for high vacuum pumping of the process chamber and a 17.7 cfm two stage mechanical pump provides for rough vacuum.

Regeneration of the process chamber cryo pump is performed automatically.

In addition to all of the above MAT-VAC 8X series standard features, MAT-VAC has incorporated numerous Advanced Features that make the MAT-VAC 8X one of the most versitile and technologically advanced R&D/Pilot Production batch sputtering systems on today's market.