MVT-60X/T Series Sputtering Systems

Evolved from the popular MRC 603, the MAT-VAC 60X/T Series Universal Sputterer™ automated in line batch sputtering systems feature a Load Lock Chamber is high vacuum pumped by a dedicated Pfeiffer Balzers Model TPH (TPU) 170 turbomolecular pump together with a Pfeiffer Balzers 300 Series turbomolecular power supply. The Load Lock Dome is the MRC 603 type hinged at left hand side, vertical "Sputter Sideways" mode of sputtering is a key design feature for minimizing defect causing particulates from target materials that are prone to generate particles, three target positions are standard, DC magnetron, RF magnetron and RF diode sputtering mode capabilities at each target position, an RF etch platform which can also function for substrate cooling. In process heating of substrates via a quartz radiant heater array is available above the RF etch station, a shutter is utilized to prevent contamination between adjacent targets and also to safe guard the quartz heater lamps from RF etching

The unique design of the dual level load lock functions to permit the simultaneous processing of two nominal 13" X 13" pallets (one pallet can be undergoing process in the main process chamber, while a second pallet is being pumped down in the load lock).

Single, and bi-directional substrate scanning modes are featured for the utmost process control under the control of a modern state of the art motor/speed control system and optical encoder for precise positioning.

Cathodes choices available to cover every conceivable sputtering application consist of MRC type DC magnetron w/ clamp on target designs, RF/DC planar magnetron, RF magnetron Model II and RF diode.

A modern RF automatic matching network provides excellent, stable RF tuning capabilities for RF sputtering and RF etching. Advanced Energy solid state RF power supplies are available in 1250 and 3000 watts. The MAT-VAC design employs vacuum relays to switch between RF and DC modes and cathode selection.

Advanced Energy solid state power supplies are available in 5 and 10 KW models for DC magnetron sputtering.

Up to 4 sputtering gas channels are available with modern MKS Instrumentation.

Vacuum gauging controls consists of modern digital Granville Philips 307 and Digivac.

A CTI-8 cryo pump is provided for high vacuum pumping of the process chamber and a 27 cfm two stage direct drive mechanical pump provides for rough vacuum.

Regeneration of the process chamber cryo pump is performed automatically.

In addition to all of the above MAT-VAC 60X/T series standard features, MAT-VAC has incorporated numerous Advanced Features that make the MAT-VAC 60X/T one of the most technologically advanced load lock batch sputtering systems on today's market.