MAT-VAC Technology, Inc. - Thin Film Coating Quote Request Form
Thin Film Coating Quote Request Form
Client Contact Information
Please fill out the following information, so that we can correctly route the quotation to you. MAT-VAC quotations are normally faxed.
Name:
Company Name:
E-Mail Address:
Address:
City:
State/Province:
Zip Code:
Country:
Phone:
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Fax:
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Thin Film Coating(s) To Be Quoted
Please fill out the following information, to the best of your ability, so we can quote you correctly. If you are not certain about a process parameter, then please provide your best estimation or leave blank. A process specialist will contact you for additional information.
Thin Film Coating quotations typically consist of a daily flat rate plus a one time setup charge. Depositions involving precious metals will include an additional charge.
Submit multiple requests if more than one Thin Film Coating project quote is required.
Thin Film Application:
Microelectronics
Hybrid Devices
Discrete Components
Optical Coatings
Materials Science
Energy-Related Films, etc.
Other:
If Other, Explain:
Number and size of wafers, lens, coupons, samples, substrates, fragments to be processed per run and substrate material composition:
Deposition No. 1
Material:
Sputtering Mode:
RF Diode
RF Magnetron
DC Magnetron
DC Pulsed Magnetron
Other:
If other, explain:
Desired Thickness:
(
in angstroms
)
Desired Uniformity:
Other:
e.g. refraction index, resistivity, transmission, reflectivity...
Process Conditions:
Check all that apply
Substrate Heat
Substrate Cooling
RF Sputter Pre-etch
RF or DC bias
Substrate Movement
Static Deposit
Reactive Sputtering
Deposition No. 2
Material:
Sputtering Mode:
RF Diode
RF Magnetron
DC Magnetron
DC Pulsed Magnetron
Other:
If other, explain:
Desired Thickness:
(
in angstroms
)
Desired Uniformity:
Other:
e.g. refraction index, resistivity, transmission, reflectivity...
Process Conditions:
Check all that apply
Substrate Heat
Substrate Cooling
RF Sputter Pre-etch
RF or DC bias
Substrate Movement
Static Deposit
Reactive Sputtering
Deposition No. 3
Material:
Sputtering Mode:
RF Diode
RF Magnetron
DC Magnetron
DC Pulsed Magnetron
Other:
If other, explain:
Desired Thickness:
(
in angstroms
)
Desired Uniformity:
Other:
e.g. refraction index, resistivity, transmission, reflectivity...
Process Conditions:
Check all that apply
Substrate Heat
Substrate Cooling
RF Sputter Pre-etch
RF or DC bias
Substrate Movement
Static Deposit
Reactive Sputtering
Deposition No. 4
Material:
Sputtering Mode:
RF Diode
RF Magnetron
DC Magnetron
DC Pulsed Magnetron
Other:
If other, explain:
Desired Thickness:
(
in angstroms
)
Desired Uniformity:
Other:
e.g. refraction index, resistivity, transmission, reflectivity...
Process Conditions:
Check all that apply
Substrate Heat
Substrate Cooling
RF Sputter Pre-etch
RF or DC bias
Substrate Movement
Static Deposit
Reactive Sputtering
My requirement is:
Immediate, formal quote needed
Quote goes into a grant proposal; budgetary or ballpark quote is okay
Inquiring Only: No quote needed at this time. Add me to your mailing list for future
Additional Comments: