Oxides

MATERIAL	FORMULA	STANDARD PURITIES, %	THEORETICAL DENSITY, g/cm³	MELTING POINT, ^oC	FABRICATION METHOD	APPLICATIONS
Aluminum oxide	Al₂O₃	99.99	3.99	2045	Hot-pressed	Protection of aluminum mirrors. High temperature dielectric.

Antimony oxide	Sb₂O₃	99.9	5.20	655	Hot-pressed	Dielectric interference filter for ultra-violet radiation; use with cryolite.

Barium titanate	BaTiO₃	99.9 99.6	6.06	1612	Hot-pressed	Thin-film capacitor.

Bismuth oxide	Bi₂O₃	99.9	8.9	820	Hot-pressed	Beam splitter.

Bismuth titanate	Bi₂Ti₄O₁₁	99.9	6.09	900	Hot-pressed	Beam splitter. Base coating for gold films for heating elements on glass.

Bismuth titanate	Bi₄Ti₃O₁₂	99.9	8.11	900	Hot-pressed

Cerium oxide	CeO₂	99.9	7.30	1950	Hot-pressed	High index film; multilayer; anti-reflection coating.

Chromium oxide	Cr₂O₃	99.8	5.21	>2000	Hot-pressed	Absorbent brown film with medium index.

Europium-doped yttrium vanadate	YVO₃-xEu₂O₃	99.9	varies	varies	Hot-pressed	Phosphorescent coating on special currency papers.

Gallium oxide	Ga₂O₃	99.999	5.88	1900	Hot-pressed	Dielectric film.

Germanium oxide	GeO₂	99.999	4.23	1115	Hot-pressed

Hafnium oxide (unstabilized)	HfO₂	99.95	9.68	2790	Hot-pressed	Dielectric coating. Very hard, adherent film.

Hafnium oxide (stabilized)	HfO₂—10-15 wt. % CaO	99.0	varies	varies	Hot-pressed

Hafnium oxide (stabilized)	HfO₂—10-15 wt. % Y₂O₃	99.0	varies	varies	Hot-pressed

Indium oxide	In₂O₃	99.999 99.99	7.18	2000	Hot-pressed	Transparent conductive films in electro-optical displays of the liquid crystal, electro-luminescent and gas discharge types.

Indium oxide- tin oxide	xIn₂O₃ - ySnO₂	99.999 99.99	varies	varies	Hot-pressed

Iron oxide	Fe₂O₃	99.99 99.9	5.25	1565	Hot-pressed	Beam splitter and interference layers. Magnetic films.

Iron oxide	Fe₃O₄	99.5	5.18	1594	Hot-pressed

Lanthanum oxide	La₂O₃	99.99	6.6	2250	Hot-pressed	Thin film capacitors. Possible uses in PLZT devices. (Very moisture sensitive.)

Lead titanate	PbTiO₃	99.9	7.52	—	Hot-pressed	Thin film capacitors.

Lead zirconate	PbZrO₃	99.7	7.81	—	Hot-pressed

Lithium niobate	LiNbO₃	99.9	4.64	1253	Hot-pressed	Piezoelectrics.

Lutetium iron oxide (garnet)	Lu₃Fe₅O₁₂	99.9	7.15	—	Hot-pressed	Bubble memory devices.

Magnesium oxide	MgO	99.99 99.5	3.58	2802	Hot-pressed	High tempature dielectric.

Molybdenum oxide	MoO₃	99.99	4.69	795	Hot-pressed	Luminescent coatings.

Niobium oxide	Nb₂O₅	99.95	4.47	1460	Hot-pressed	Dielectric coating. Multilayers.

Rare earth garnets	Ln₃M₅O₁₂	99.9	varies	varies	Hot-pressed	Bubble memory devices.

Rare earth oxides	varies	99.999, 99.99 99.9	varies	varies	Hot-pressed	Possible dielectric coatings.

Silicon dioxide	SiO₂	99.995 99.97	2.21	1713	Hot-pressed	Hard durable film with low index. Insulating layer.

Silicon monoxide	SiO	99.99 99.9	2.13	1700	Hot-pressed	Protective film for front surface aluminized mirrors. Low index layer for infrared filters.

Strontium titanate	SrTiO₃	99.9	4.15	2040	Hot-pressed	Thin film capacitors.

Strontium zirconate	SrZrO₃	99.0	5.48	—	Hot-pressed

Tantalum oxide	Ta₂O₅	99.95	7.53	1880	Hot-pressed	Dielectric film. Multilayers.

Thorium oxide	ThO₂	99.99	9.86	2100	Hot-pressed	RADIOACTIVE. Highly durable beam splitter.

Tin oxide	SnO₂	99.9	6.85	>1930	Hot-pressed	Transparent conductive film. Also in varistors.

Titanium oxide	TiO₂	99.995 99.9	4.24	1855	Hot-pressed	High index film, multilayer interference filters.

Tungsten oxide	WO₃	99.99	7.16	1473	Hot-pressed	Shadow casting for electron microscopy.

Yttrium aluminum oxide (YAG)	Y₃Al₅O₁₂	99.9	4.55	1950	Hot-pressed	Bubble memory devices.

Yttrium iron oxide (garnet)	Y₃Fe₅O₁₂	99.99 99.9	5.10	1575	Hot-pressed	Ferromagnetic films. Bubble memory devices.

Yttrium oxide	Y₂O₃	99.999 99.99, 99.9	4.84	2400	Hot-pressed	Hard film. Dielectric coating. Thin film capacitor.

Zinc oxide	ZnO	99.999 99.9	5.66	1975	Hot-pressed	Dielectric, in varistors, in gas sensors.

Zirconium oxide (unstabilized)	ZrO₂	99.7	5.56	2687	Hot-pressed	Multilayers. Dielectric coating. Adherent coating with high refractive index.

Zirconium oxide (stabilized)	ZrO₂—5-15 wt. % CaO	99.0	varies	varies	Hot-pressed

Zirconium oxide (stabilized)	ZrO₂—10-15 wt. % Y₂O₃	99.0	varies	varies	Hot-pressed

High Purity Sputtering Targets

Related Links:
- Metals and Alloys
- Oxides and Nitrides
- Precious Metal Conversions
- Thickness Conversion Table
- Periodic Table

Sputtering Target Data:
- Metal Alloys & Intermetallics
- Carbides
- Pure Metals
- Nitrides
- Oxides

PVD Materials:
- PVD Materials Overview
- Sputtering Targets
- Evaporation Materials
- E.B. Starter Sources
- Crucible Liners
- Backing Plates
- Evaporation/Crucible Table
- Request a Quotation

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