EVAPORATION
MATERIAL |
TEMPERATURE (ºC)
@ VAP. PRESSURE |
EVAPORATION TECHNIQUES |
REMARKS
n = Index
of Refraction |
10-8
TORR |
10-6
TORR |
10-4
TORR |
ELECTRON
BEAM |
CRUCIBLE |
COIL |
BOAT |
 |
Chromium
Bromide (CrBr2) |
— |
— |
550 |
— |
— |
— |
Inconel |
— |
|
Chromium
Carbide (Cr3C2) |
— |
— |
-2000 |
Fair |
— |
— |
W |
— |
|
Chromium
Chloride (CrCl2) |
— |
— |
550 |
— |
— |
— |
Fe
Inconel |
Sublimes easily. |
|
Chromium
Oxide (Cr2O3) |
— |
— |
-2000 |
Good |
— |
— |
W Mo |
Disproportionates to lower oxides, reoxidizes @ 600ºC in air. n = 2.4 |
|
Chromium
Silicon
Monoxide (Cr-SiO) |
IC |
IC |
IC |
Good |
— |
— |
W |
Flash. |
|
|
Cobait (Co) |
850 |
990 |
1200 |
Excel. |
Al2O3
BeO |
— |
W Cb |
Alloys with refractory metals. |
|
Cobalt
Bromide (CoBr2) |
— |
— |
400S |
— |
— |
— |
Inconel |
— |
|
Cobalt
Chloride (CoCl2) |
— |
— |
472S |
— |
— |
— |
Inconel |
— |
|
Cobalt
Oxide (CoO) |
— |
— |
— |
— |
— |
— |
— |
Sputtering preferred. |
|
|
Copper (Cu) |
727 |
857 |
1017 |
Excel. |
Al2O3
Mo, Ta |
W |
Mo |
Films do not adhere well. Use intermediate layer, e.g., chromium. Evaporates from
any source material. |
|
Copper
Chloride (CuCl) |
— |
— |
-600 |
— |
— |
— |
— |
n = 1.93 |
|
Copper
Oxide (Cu2O) |
— |
— |
-600S |
Good |
Al2O3 |
— |
Ta |
Evaporate in 10-2 - 10-4 of O2; n = 2.70 J. Electrochem.
Soc. 110, 119 (1967) |
|
Copper
Sulfide (Cus) |
— |
— |
-500S |
— |
— |
— |
— |
n = 1.45 |
|
|
Cryolite (Na3AlF6) |
1020 |
1260 |
1480 |
Excel. |
Vit. Carbon |
— |
W Mo
Ta |
Large chunks reduce spitting. Little decomposition. n = 2.34 at 6330A App. Opt. 15,
1969 (1976) |
|
|
Dysprosium (Dy) |
625 |
750 |
900 |
Good |
— |
— |
Ta |
— |
|
Dysprosium
Fluoride (DyF3) |
— |
— |
-800S |
Good |
— |
— |
Ta |
— |
|
Dysprosium
Oxide (Dy2O3) |
— |
— |
-1400 |
— |
— |
— |
Ir |
Loses oxygen. |
|
|
Erbium (Er) |
650S |
775S |
930S |
Good |
— |
— |
W Ta |
— |
|
Erbium
Fluoride (ErF3) |
— |
— |
-750 |
— |
— |
— |
Mo |
JVST A3 (6) 2320 |
|
Erbium
Oxide (Er2O3) |
— |
— |
-1600 |
— |
— |
— |
Ir |
Loses oxygen. |
|
|
Europium (Eu) |
280S |
360S |
480S |
Fair |
Al2O3 |
— |
W Ta |
Low tantalum solubility. |
|
Europium
Fluoride (EuF2) |
— |
— |
-950 |
— |
— |
— |
Mo |
— |
|
Europium
Oxide (Eu2O3) |
— |
— |
-1600 |
Good |
ThO2 |
— |
Ir Ta
W |
Loses oxygen; films clear and hard. |
|
Europium
Sulphide (EuS) |
— |
— |
— |
Good |
— |
— |
— |
— |
|
|
Gadolinium (Gd) |
760 |
900 |
1175 |
Excel. |
Al2O3 |
— |
Ta |
High Ta solubility. |
|
Gadolinium
Oxide (Gd2O3) |
— |
— |
— |
Fair |
— |
— |
Ir |
Loses oxygen. n = 1.8 @ .55µ |
|
|
Gallium (Ga) |
619 |
742 |
907 |
Good |
Al2O3
BeO
Quartz |
— |
— |
Alloys with refractory metals. Use EB gun. |
|
Gallium
Antimonide (GaSb) |
— |
— |
— |
Fair |
— |
— |
W Ta |
Flash evaporate. |
|
Gallium
Arsenide (GaAs) |
— |
— |
— |
Good |
Carbon |
— |
W Ta |
Flash evaporate. n = 5.64 @ 10.6µ |
|
Gallium
Nitride (GaN) |
— |
— |
-200 |
— |
Al2O3 |
— |
— |
Evaporate Ga in 10-3 N2- |
|
Gallium
Oxide (ß) (Ga2O3) |
— |
— |
— |
— |
— |
— |
Pr W |
Loses oxygen. |
|
Gallium
Phosphide (GaP) |
— |
770 |
920 |
— |
Quartz |
— |
W Ta |
Decomposes vapor mostly P. |
|
|
Germanium (Ge) |
812 |
957 |
1167 |
Excel. |
Quartz
Al2O3 |
— |
W C
Ta |
Excellent films from EB sources. Use .040 W. n = 4.01 |
|
Germanium
Nitride (Ge3N2) |
— |
— |
-650S |
— |
— |
— |
— |
Sputtering preferred. |
|
Germanium
Oxide (GeO2) |
— |
— |
-625 |
Good |
Quartz
Al2O3 |
— |
Ta Mo |
Similar to SiO, film predominately GeO. |
|
Germanium
Telluride (GeTe) |
— |
— |
381 |
— |
Quartz
Al2O3 |
— |
W Mo |
— |
|
